Process fluid path switching in recipe operations

ABSTRACT

A method includes identifying time values for a length of time to carry out process fluid delivery within multiple processing chambers that concurrently process multiple substrates; translating each time value to a recipe parameter for execution of an operation of a processing recipe; and causing the operation to be performed using each recipe parameter as a control value to control valves of a fluid panel of the multiple processing chambers. For each processing chamber of the multiple processing chambers, selectively controlling process fluid flow to the process chamber for a first period of time corresponding to a time value of the set of time values and to a divert foreline of the process chamber for a second period of time.

RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.17/248,106, filed Jan. 8, 2021, which is hereby incorporated in itsentirety herein by reference.

TECHNICAL FIELD

This instant specification generally relates to gas delivery to aprocessing chamber. More specifically, the instant specification relatesto process fluid path switching in recipe operations.

BACKGROUND

Manufacturing of modern materials often involves various depositiontechniques, such as Chemical Vapor Deposition (CVD) or Physical VaporDeposition (PVD) techniques, in which atoms or molecules of one or moreselected types are deposited on a wafer (substrate) held in low or highvacuum environments that are provided by vacuum processing (e.g.,deposition, etching, etc.) chambers. For example, CVD depositionprocesses are used for a broad spectrum of applications. Othertechniques involve use of process fluids for etching already-existentfilms on the wafer. These applications range from patterning films toinsulation materials in transistor structures and between the layers ofconducting metal that form the electrical circuit. Applications includeshallow-trench isolation, pre-metal dielectric, inter-metal dielectric,and passivation. They are also employed in strain engineering that usescompressive or tensile stress films to enhance transistor performancethrough improved conductivity. Depending on the type of film to bedeposited on a substrate, a precursor (gaseous or liquid) is deliveredto the process chamber where the thermal oxidation or reactions resultsin depositing the desired film.

Other process fluids (gas or liquids) are also used as process orcarrier fluids that transport chemicals or plasmas to the processingchamber for any of these processing techniques. Some processing toolsinclude multi-compartment processing chambers that include multipleslots to separate processing chambers, where each chamber is separatelysupplied with the process fluid. Best practices in processing multiplesubstrates in these multiple processing chambers is to vary processingcontrol parameters in various recipe operations such that deposited oretched films are as uniform as possible.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a schematic block diagram of an example processing system forprocess fluid path switching in recipe operations according to someimplementations.

FIG. 1B is a schematic block diagram illustrating additional details ofsome of the components of the processing system of FIG. 1A according tosome implementations.

FIG. 2 is a flow diagram of a method for process fluid path switching inrecipe operations according to some implementations.

FIG. 3 is a set of graphs that illustrate changes in an active pathidentifier that drives operation parameter values for process fluid pathswitching according to some implementations.

FIG. 4 depicts a block diagram of an example computing device operatingin accordance with one or more aspects of the present disclosure andcapable of controlling fluid path switching in recipe operationsaccording to various implementations.

SUMMARY

In one implementation, disclosed is a method that includes receiving,via a computing device providing a user interface, a set of time valuesfor a length of time to carry out process fluid delivery within multipleprocessing chambers that are concurrently processing multiplesubstrates. The method further includes translating, by the computingdevice, each time value of the set of time values to a recipe parameterfor execution of an operation of a processing recipe. The method furtherincludes causing, by the computing device, the operation to be performedusing each recipe parameter as a control value to control valves of afluid panel of the multiple processing chambers. The causing theoperation to be performed, for each processing chamber of the multipleprocessing chambers, further includes: causing the process fluid to flowto the processing chamber for a first period of time corresponding to atime value of the set of time values; and causing the process fluid toflow to a divert foreline of the processing chamber for a second periodof time, the second period of time being based on a timestep of theoperation and the time value.

In another implementation, disclosed is a system that includes a memoryand a processing device, operatively coupled to the memory, to: receive,via a user interface, a set of time values for a length of time to carryout process fluid delivery within multiple processing chambers that areconcurrently processing multiple substrates. The processing device isfurther to translate each time value of the set of time values to arecipe parameter for execution of an operation of a processing recipe.The processing device is further to cause the operation to be performedusing each recipe parameter as a control value to control valves of afluid panel of the multiple processing chambers. To cause the operationto be performed can include, for each processing chamber of the multipleprocessing chambers: causing the process fluid to flow to the processingchamber for a first period of time corresponding to a time value of theset of time values; and causing the process fluid to flow to a divertforeline of the processing chamber for a second period of time, thesecond period of time being based on a timestep of the operation and thetime value.

In another implementation, disclosed is a non-transitory computerreadable storage medium storing instructions that, when executed by aprocessing device, cause the processing device to perform multipleoperations, including receiving, via a user interface, a set of timevalues for a length of time to carry out process fluid delivery withinmultiple processing chambers that are concurrently processing multiplesubstrates. The operations further includes translating each time valueof the set of time values to a recipe parameter for execution of anoperation of a processing recipe and causing the operation to beperformed using each recipe parameter as a control value to controlvalves of a fluid panel of the multiple processing chambers. The causingincludes, for each processing chamber of the multiple processingchambers: causing the process fluid to flow to the processing chamberfor a first period of time corresponding to a time value of the set oftime values; and causing the process fluid to flow to a divert forelineof the processing chamber for a second period of time, the second periodof time being based on a timestep of the operation and the time value.

DETAILED DESCRIPTION

The implementations disclosed herein provide for selective control ofsending process fluid to each of multiple processing chambers ordiverted to exhaust (or recycle) depending on time values to beprogrammed for a recipe operation in each processing chamber. Processengineers, in designing and controlling semiconductor processingfabrication tools and systems use Chamber Fingerprinting and Matching(CFM) to improve uniformity of processing across processing chambers.This CFM can be built into the tool control system, which uses sensordata, flow rates, time, temperature values, film thicknesses, and othersuch information to generate a fingerprint. If the same fingerprinttaken at a later time varies in certain ways after initial deployment ofthe processing system online, the tool control system can vary controlparameters that improve uniformity of deposition and etch processingacross the multiple chambers. In conventional systems, a lack ofsufficient uniformity can decrease the yield of manufactured devices dueto defects of in processed substrates.

In some implementations, the present disclosure focuses on control ofprocess fluids, such as gas or liquid used for semiconductor processing,in a way that leads to uniform deposition or etching of films onsubstrates (wafers) located in multiple processing chambers of the sameprocessing system. In some embodiments, the process fluid is a carriergas that is to carry another (e.g., process) gas. In one implementation,the multiple processing chambers correspond to multiple processingcompartments of a quad processing chamber, each including a slot forreceiving a separate substrate. Due to tolerance mismatches in CFMacross the multiple processing chambers, the amount of time that aprocess fluid is sent to each processing chamber of multiple processingchambers can vary. Process fluid lines, however, can get clogged if notcausing the process fluid to flow during the entirety of the recipeoperation. Thus, the process fluid can be diverted (e.g., sent toexhaust or recycle) when the process fluid is not being directed into aprocessing chamber. Further, to avoid duplication of the entire processfluid delivery system for each processing chamber (or compartment), themultiple processing chambers share a process fluid source and employ afluid panel in which a fluid flow controller is employed to send theprocess fluid to multiple fluid control valves, each corresponding to aseparate processing chamber.

In these implementations, a computing device coupled to the fluid panelselectively controls the amount of time each control valve of a set ofcontrol valves in the fluid panel either sends the process fluid to acorresponding processing chamber, of the multiple processing chambers,or instead sends the process fluid to a divert foreline to be exhausted,e.g., via an abatement unit. To do so, the computing device firsttranslates a set of time values received via a user interface to arecipe parameter for execution of an operation of a processing recipe.The recipe parameter is then used as a control value for the controlvalves of the fluid panel. In one implementation, for each processingchamber, the recipe parameter causes the process fluid to flow to theprocessing chamber for a first period of time corresponding to a timevalue of the set of time values and causes the process fluid to flow toa divert foreline of the processing chamber for a second period of time.In at least one implementation, the second period of time is based on atimestep of the operation and the time value. For example, the remainderof the timestep of the operation that the process fluid is not directedto the processing chamber can be instead be directed a divert foreline,sometimes referred to as “Divert” herein.

In the disclosed implementations, by precisely controlling the amount oftime the process fluid is directed to each of multiple processingchambers (e.g., that form a chamber system, such as a twin or quadchamber), the thickness of film on processed substrates can be moreprecisely controlled and made uniform across the multiple processingchambers. In this way, the disclosed implementations advantageously leadto increased yield due to a decrease in defects in processed substratesand corresponding manufactured devices. Further, the disclosedimplementations enable customized process fluid flow to each processingchamber without the costs associated with duplication of the entireprocess fluid delivery system for each processing chamber.

FIG. 1A is a schematic block diagram of an example processing system 100for process fluid path switching in recipe operations according to someimplementations. FIG. 1B is a schematic block diagram illustratingadditional details of some of the components of the processing system100 of FIG. 1B according to some implementations. In these exemplaryimplementations, the processing system 100 includes a computing device102, one or more process fluid sources 110, a fluid panel 112 thatincludes a fluid flow controller 120 and a set of control valves 130,multiple processing chambers 140 (PC_1, PC_, . . . PC_N), a divertforeline 150, and an abatement unit 160. The computing device 102includes at least a processing device 104, a memory 106, and a userinterface 108 (such as a graphical user interface), but a more detailedexample computing device is discussed with reference to FIG. 4 . Theprocess fluid source 110 includes any number of gases (e.g., gas_1,gas_2, . . . ), such as a carrier gas, or liquids (e.g., liquid_1,liquid_2, . . . ), which are referred to herein more generally asprocess fluid sources. The fluid panel 112 mixes one or more of theprocess fluids provided by the process fluid sources 110 beforecontrolling delivery thereof through the set of control valves 130.

In various implementations, the fluid panel 112 includes one of morefluid flow controllers 120 and a set of control valves 130. The one ormore fluid flow controllers 120 includes a mass flow controller (MFC)124 for gas and a liquid flow controller (LFC) 128 for liquid. The setof control valves 130 can include a set of isolation valves 134 (“Iso”valves) and a set of divert valves 138 (“Div” valves), illustrated inadditional detail with reference to FIG. 1B, which is an example of aquad processing chamber that includes four separate processing chambers.Each isolation valve 134 is coupled to one of the processing chambers140 and each divert valve 138 is coupled to the divert foreline 150. Thedivert foreline 150 is coupled to and directs excess process fluid to anabatement unit 160 to be either recycled or exhausted. Although FIG. 1Billustrates a quad processing chamber by way of example, differentnumbers of processing chambers and corresponding set of control valves130 are envisioned.

In these implementations, the computing device 102 can be coupled to thefluid panel 112. The computing device 102 includes the processing device104, which can execute or perform instructions to control process fluidflow from the process fluid source 110 through the fluid panel 112 andto the processing chambers 140 and divert foreline 150. In someimplementations, the computing device 102 receives a set of time values(e.g., through the user interface 108) for a length of time to carry outprocess fluid delivery within the multiple processing chambers (PC_1,PC_, . . . PC_N) that concurrently process multiple substrates. The setof time values can either correspond to a divert (or switch) time or toa length of process time. The computing device 102 can translate eachvalue of the set of time values to a recipe parameter for execution ofan operation of a processing recipe.

In some implementations, the computing device 102 then causes theoperation to be performed using each recipe parameter as a control valueto the control valves 130, as will be discussed in more detail. As oneexample, for each processing chamber of the multiple processing chambers140, the computing device 192 causes the process fluid to flow to theprocessing chamber for a first period of time corresponding to a timevalue of the set of time values, and causes the process fluid to flow toa divert foreline of the processing chamber for a second period of time.The second period of time can be based on a timestep of the operationand the time value. For example, if the timestep (e.g., total time) ofthe operation is 10 seconds and the time value is 8 seconds for processtime, then the first period of time is 8 seconds and the second periodof time is 2 seconds. In another example, if the timestep of theoperation is 10 seconds and the time value is 3 seconds for divert (orswitch) time, then the first period of time is 7 seconds and the secondperiod of time is 3 seconds. Thus, in implementations, a combination ofeach first period of time and each second period of time equals thetimestep of the operation.

With additional specificity, with reference to the implementation ofFIG. 1B, a first fluid line 126A is coupled (or connected) to the fluidflow controller 120. A first isolation valve (Iso_1) can be coupledbetween the first fluid line 126A and a first processing chamber (PC_1).A first divert valve (Div_1) can be coupled between the first fluid line126A and the divert foreline 150. Each of the first isolation valve andthe first divert valve can be said to be mutually exclusive; while bothcan remained closed, both cannot be opened at the same time. In someimplementations, the first isolation valve, the first divert valve, andthe MFC 124 is referred to as a first gas (or liquid) stick and isseparately controllable by a recipe parameter. A gas/liquid stick is anassembly that includes multiple active devices or fluid flow componentsused to deliver gas or liquid from the fluid panel 112 to variousdestinations, such as to the processing chamber 140, to the divertforeline 150, and to the abatement unit 160. Thus, the computing device102 can generate software control values adapted to control differentgas or liquid sticks to direct process fluid along predetermined pathsfor programmed lengths of time.

Further, a second fluid line 126B is coupled (or connected) to the fluidflow controller 120. A second isolation valve (Iso_2) can be coupledbetween the second fluid line 126A and a second processing chamber(PC_2). A second divert valve (Div_2) can be coupled between the secondfluid line 126A and the divert foreline 150. Each of the secondisolation valve and the second divert valve can be said to be mutuallyexclusive; while both can remained closed, both cannot be opened at thesame time. In some implementations, the second isolation valve, thesecond divert valve, and the MFC 124 is referred to as a second gas (orliquid) stick and is separately controllable by a recipe parameter.

Additionally, a third fluid line 126B is coupled (or connected) to thefluid flow controller 120. A third isolation valve (Iso_3) can becoupled between the third fluid line 126A and a third processing chamber(PC_3). A third divert valve (Div_3) can be coupled between the thirdfluid line 126A and the divert foreline 150. Each of the third isolationvalve and the third divert valve can be said to be mutually exclusive;while both can remained closed, both cannot be opened at the same time.In some implementations, the third isolation valve, the third divertvalve, and the MFC 124 is referred to as a third gas (or liquid) stickand is separately controllable by a recipe parameter.

Further, a fourth fluid line 126B is coupled (or connected) to the fluidflow controller 120. A fourth isolation valve (Iso_4) can be coupledbetween the fourth fluid line 126A and a fourth processing chamber(PC_4). A fourth divert valve (Div_4) can be coupled between the fourthfluid line 126A and the divert foreline 150. Each of the fourthisolation valve and the fourth divert valve can be said to be mutuallyexclusive; while both can remained closed, both cannot be opened at thesame time. In some implementations, the fourth isolation valve, thefourth divert valve, and the MFC 124 is referred to as a fourth gas (orliquid) stick and is separately controllable by a recipe parameter.

FIG. 2 is a flow diagram of a method 200 for process fluid pathswitching in recipe operations according to some implementations. Themethod 200 can be performed by processing logic that can includehardware (e.g., processing device, circuitry, dedicated logic,programmable logic, microcode, hardware of a device, integrated circuit,etc.), software (e.g., instructions run or executed on a processingdevice), or a combination thereof. In some implementations, the method200 is performed by the processing system 100 and components shown inFIGS. 1A-1B or any combination thereof. The method 200 can be performedusing a single processing device or multiple processing devices. Some ofthe operations of method 200 can be optional, indicated by the dashedlines. In implementations, some operations of the method 200 areperformed by the computing device 102 and the processing device 104.

At operation 210, the processing logic identifies a set of time valuesfor a length of time to carry out process fluid delivery within themultiple processing chambers 140 that concurrently process multiplesubstrates. In one embodiment, the time values are received through theuser interface 108. In another embodiment, the time values arepre-stored and are retrieved, e.g., from the memory 106 or othercomputer storage such discussed with respect to FIG. 4 .

At operation 215, the processing logic translates each value of the setof time values (e.g., received via the user interface 108 from anoperator) to a recipe parameter for execution of an operation of aprocessing recipe. In some implementations, the computing device 102also correlates the set of time values with the process fluid forexecution of the operation of the processing recipe, as the time periodfor flowing the process fluid can vary depending on the process fluid.

At operation 220, the processing logic causes the operation to beperformed using each recipe parameter as a control value to the controlvalves 130 of the fluid panel 112 of the multiple processing chambers140. The processing logic can direct control of the fluid flowcontroller 120 (as per operations 235-240) and the set of control valves130 according to the recipe parameters determined during translation.

For example, at operation 225, the processing logic causes the processfluid to flow to the processing chamber 140 for a first period of timecorresponding to a time value of the set of time values. Further, atoperation 230, the processing logic causes the process fluid to flow tothe divert foreline 150 of the processing chamber 140 for a secondperiod of time, the second period of time being based on a timestep ofthe operation and the time value.

At operation 235, the processing logic generates, using the set of timevalues, the control values and second control values. At operation 240,the processing logic sends the control values and the second controlvalues to the fluid flow controller 120 coupled to a source of theprocess fluid with which to selectively cause the process fluid to flowduring the operation or during multiple operations. In oneimplementation, the source is one or more of the process fluid sources110.

In various implementations, with further reference to operation 215, theprocessing logic translates (or converts) each time value to a recipeparameter that indicates a time period and that has a positive sign or anegative sign. For example, in some implementations, a positive signdirects the fluid panel 112 to cause the process fluid to flow to theprocessing chamber 140 at the start of the recipe operation, followed byto flow to the divert foreline 150 for the rest of the timestep of therecipe operation. In other words, when the recipe parameter is positive,causing the process fluid to flow to the processing chamber 140 isperformed before causing the process fluid to flow to the divertforeline 150.

Table 1 is an example implementation for positively signed recipeparameters, for which the default flow path is “FlowToCh.” Withreference to Table 1, “mgm” is milligrams per minute flow rate fortetraethyl orthosilicate (TEOS) liquid and “sccm” is standard cubiccentimeters per minute flow rate for argon (Ar) carrier gas. Each recipeoperation parameter is named “<GasName> Path Switch Time.”

TABLE 1 TEOS-LIQ 1000 mgm FlowToCh TEOS-LIQ Path Switch Time 4 s 3 s 2 s0 s AR-CARRIER 500 sccm FlowToCh AR-CARRIER Path Switch Time 4 s 3 s 2 s0 s

TABLE 2 Slot Number Processing Chamber Divert Slot 1 6 seconds to PC_1 4seconds to Divert Foreline Slot 2 7 seconds to PC_2 3 seconds to DivertForeline Slot 3 8 seconds to PC_3 2 seconds to Divert Foreline Slot 4 10seconds to PC_4 0 seconds to Divert Foreline

Based on Table 1, whether the liquid or the carrier gas, Table 2illustrates how the translated parameters would be interpreted fordirecting flow within the fluid panel 112, as related to the fourprocessing chambers (PC_1, PC_2, PC_3, and PC_4) of corresponding to thefour slots of a quad processing chamber, e.g., first to ProcessingChamber, than to Divert for each slot. When the recipe parameter iszero, causing the process fluid to flow to the processing chamber 140 isperformed during an entirety of the timestep of the operation of theprocessing recipe, e.g., here for 10 seconds.

In another implementation, a negative sign directs the fluid panel 112to cause the process fluid to flow to the divert foreline 150 at thestart of the recipe operation, followed by to flow to the processingchamber 140 for the rest of the of the timestep of the recipe operation.In other words, when the recipe parameter is negative, causing theprocess fluid to flow to the divert foreline 150 is performed beforecausing the process fluid to flow to the processing chamber 140. Table 3is an example implementation for negatively signed recipe parameters.Each recipe operation parameter is named “<GasName> Path Switch Time.”

TABLE 3 TEOS-LIQ 1000 mgm FlowToCh TEOS-LIQ Path Switch Time −3 s −2 s−3 s −1 s AR-CARRIER 500 sccm FlowToCh AR-CARRIER Path Switch Time −3 s−2 s −3 s −1 s

TABLE 4 Slot Number Divert Processing Chamber Slot 1 3 seconds to DivertForeline 7 seconds to PC_1 Slot 2 2 seconds to Divert Foreline 8 secondsto PC_2 Slot 3 3 seconds to Divert Foreline 7 seconds to PC_3 Slot 4 1seconds to Divert Foreline 9 seconds to PC_4

Based on Table 3, whether the liquid or the carrier gas, Table 4illustrates how the translated parameters would be interpreted fordirecting flow within the fluid panel 112, as related to the fourprocessing chambers (PC_1, PC_2, PC_3, and PC_4), e.g., first to Divert,then to Processing Chamber for each slot.

FIG. 3 is a set of graphs that illustrate changes in an active pathidentifier (ID) that drives operation parameter values for process fluidpath switching according to some implementations. The active path ID canbe, for example, a single encoded value (e.g., from 16 different values)that drives which slot flow destinations (e.g., processing chambers orcompartments in a quad processing chamber) are being directed tochamber, to divert, or a combination of chamber and divert for differentslots. In various embodiments, each variable graph illustrates how theactive path ID changes within the recipe operation being currently run.

In a first graph 300A, the y-axis is associated with the active path IDfor a first gas (or liquid) stick, and in the second graph 300B, they-axis is associated with the active path ID for a second gas (orliquid) stick during a series of recipe operations. The numbers acrossthe top of each graph represents a different recipe operation number,and the x-axis represents time. The first graph 300A and the secondgraph 300B are examples of graphs made available to an operator withinthe user interface 108 to track, or by way of report, that the activepath ID is changing correctly according to a programmed series of recipeoperations.

FIG. 4 depicts a block diagram of an example computing device 400operating in accordance with one or more aspects of the presentdisclosure and capable of controlling fluid path switching in recipeoperations according to various implementations. The computing device400 can be the computing device 102 or a microcontroller of thecomputing device 102 of FIG. 1A, in one implementation.

Example computing device 400 can be connected to other processingdevices in a LAN, an intranet, an extranet, and/or the Internet. Thecomputing device 400 can be a personal computer (PC), a set-top box(STB), a server, a network router, switch or bridge, or any devicecapable of executing a set of instructions (sequential or otherwise)that specify actions to be taken by that device. Further, while only asingle example processing device is illustrated, the term “processingdevice” shall also be taken to include any collection of processingdevices (e.g., computers) that individually or jointly execute a set (ormultiple sets) of instructions to perform any one or more of the methodsdiscussed herein.

Example computing device 400 can include a processing device 402 (e.g.,a CPU), a main memory 404 (e.g., read-only memory (ROM), flash memory,dynamic random access memory (DRAM) such as synchronous DRAM (SDRAM),etc.), a static memory 406 (e.g., flash memory, static random accessmemory (SRAM), etc.), and a secondary memory (e.g., a data storagedevice 418), which can communicate with each other via a bus 430.

The processing device 402 represents one or more general-purposeprocessing devices such as a microprocessor, central processing unit, orthe like, and include processing logic 426. More particularly, theprocessing device 402 can be a complex instruction set computing (CISC)microprocessor, reduced instruction set computing (RISC) microprocessor,very long instruction word (VLIW) microprocessor, processor implementingother instruction sets, or processors implementing a combination ofinstruction sets. The processing device 402 can also be one or morespecial-purpose processing devices such as an application specificintegrated circuit (ASIC), a field programmable gate array (FPGA), adigital signal processor (DSP), network processor, or the like. Inaccordance with one or more aspects of the present disclosure, theprocessing device 402 can be configured to execute instructionsimplementing method 200 of process fluid path switching in recipeoperations.

Example computing device 400 can further include a network interfacedevice 408, which can be communicatively coupled to a network 420.Example computing device 400 can further include a video display 410(e.g., a liquid crystal display (LCD), a touch screen, or a cathode raytube (CRT)), an alphanumeric input device 412 (e.g., a keyboard), aninput control device 414 (e.g., a cursor control device, a touch-screencontrol device, a mouse), and a signal generation device 416 (e.g., anacoustic speaker).

The computing device can include a data storage device 418, including acomputer-readable storage medium (or, more specifically, anon-transitory computer-readable storage medium) 428 on which is storedone or more sets of executable instructions 422. In accordance with oneor more aspects of the present disclosure, executable instructions 422can include executable instructions implementing method 300 ofmonitoring the health of delivery of a liquid in a gaseous state and/orthe methods 200 and 300.

Executable instructions 422 can also reside, completely or at leastpartially, within main memory 404 and/or within processing device 402during execution thereof by example computing device 400, main memory404 and processing device 402 also constituting computer-readablestorage media. Executable instructions 422 can further be transmitted orreceived over a network via network interface device 408.

While the computer-readable storage medium 428 is shown in FIG. 4 as asingle medium, the term “computer-readable storage medium” (or“non-transitory computer-readable storage medium storing instructions”)should be taken to include a single medium or multiple media (e.g., acentralized or distributed database, and/or associated caches andservers) that store the one or more sets of operating instructions. Theterm “computer-readable storage medium” (or “non-transitorycomputer-readable storage medium storing instructions”) shall also betaken to include any medium that is capable of storing or encoding a setof instructions for execution by the machine that cause the machine toperform any one or more of the methods described herein. The term“computer-readable storage medium” (or “non-transitory computer-readablestorage medium”) shall accordingly be taken to include, but not belimited to, solid-state memories, and optical and magnetic media.

It should be understood that the above description is intended to beillustrative, and not restrictive. Many other implementation exampleswill be apparent to those of skill in the art upon reading andunderstanding the above description. Although the present disclosuredescribes specific examples, it will be recognized that the systems andmethods of the present disclosure are not limited to the examplesdescribed herein, but can be practiced with modifications within thescope of the appended claims. Accordingly, the specification anddrawings are to be regarded in an illustrative sense rather than arestrictive sense. The scope of the present disclosure should,therefore, be determined with reference to the appended claims, alongwith the full scope of equivalents to which such claims are entitled.

The implementations of methods, hardware, software, firmware or code setforth above can be implemented via instructions or code stored on amachine-accessible, machine readable, computer accessible, or computerreadable medium which are executable by a processing element. “Memory”includes any mechanism that provides (i.e., stores and/or transmits)information in a form readable by a machine, such as a computer orelectronic system. For example, “memory” includes random-access memory(RAM), such as static RAM (SRAM) or dynamic RAM (DRAM); ROM; magnetic oroptical storage medium; flash memory devices; electrical storagedevices; optical storage devices; acoustical storage devices, and anytype of tangible machine-readable medium suitable for storing ortransmitting electronic instructions or information in a form readableby a machine (e.g., a computer).

Reference throughout this specification to “one implementation” or “animplementation” means that a particular feature, structure, orcharacteristic described in connection with the implementation isincluded in at least one implementation of the disclosure. Thus, theappearances of the phrases “in one implementation” or “in animplementation” in various places throughout this specification are notnecessarily all referring to the same implementation. Furthermore, theparticular features, structures, or characteristics can be combined inany suitable manner in one or more implementations.

In the foregoing specification, a detailed description has been givenwith reference to specific exemplary implementations. It will, however,be evident that various modifications and changes can be made theretowithout departing from the broader spirit and scope of the disclosure asset forth in the appended claims. The specification and drawings are,accordingly, to be regarded in an illustrative sense rather than arestrictive sense. Furthermore, the foregoing use of implementation,implementation, and/or other exemplarily language does not necessarilyrefer to the same implementation or the same example, but can refer todifferent and distinct implementations, as well as potentially the sameimplementation.

The words “example” or “exemplary” are used herein to mean serving as anexample, instance, or illustration. Any aspect or design describedherein as “example” or “exemplary” is not necessarily to be construed aspreferred or advantageous over other aspects or designs. Rather, use ofthe words “example” or “exemplary” is intended to present concepts in aconcrete fashion. As used in this application, the term “or” is intendedto mean an inclusive “or” rather than an exclusive “or.” That is, unlessspecified otherwise, or clear from context, “X includes A or B” isintended to mean any of the natural inclusive permutations. That is, ifX includes A; X includes B; or X includes both A and B, then “X includesA or B” is satisfied under any of the foregoing instances. In addition,the articles “a” and “an” as used in this application and the appendedclaims should generally be construed to mean “one or more” unlessspecified otherwise or clear from context to be directed to a singularform. Moreover, use of the term “an implementation” or “oneimplementation” or “an implementation” or “one implementation”throughout is not intended to mean the same implementation orimplementation unless described as such. Also, the terms “first,”“second,” “third,” “fourth,” etc. as used herein are meant as labels todistinguish among different elements and may not necessarily have anordinal meaning according to their numerical designation.

What is claimed is:
 1. A method comprising: identifying, by a computingdevice, a set of time values for a length of time to carry out processfluid delivery within multiple processing chambers that concurrentlyprocess multiple substrates; translating, by the computing device, eachtime value of the set of time values to a recipe parameter for executionof an operation of a processing recipe; and causing, by the computingdevice, the operation to be performed using each recipe parameter as acontrol value to control valves of a fluid panel of the multipleprocessing chambers, wherein the causing comprises, for each processingchamber of the multiple processing chambers, selectively controllingprocess fluid flow to the process chamber for a first period of timecorresponding to a time value of the set of time values and to a divertforeline of the process chamber for a second period of time.
 2. Themethod of claim 1, wherein the process fluid is one of a gas or aliquid.
 3. The method of claim 1, wherein each recipe parameter ispositive, and wherein causing the process fluid to flow to theprocessing chamber is performed before causing the process fluid to flowto the divert foreline.
 4. The method of claim 1, wherein each recipeparameter is negative, and wherein causing the process fluid to flow tothe divert foreline is performed before causing the process fluid toflow to the processing chamber.
 5. The method of claim 1, wherein, whenthe recipe parameter is zero, the causing the process fluid to flow tothe processing chamber is performed during an entirety of a timestep ofthe operation of the processing recipe.
 6. The method of claim 1,further comprising correlating the set of time values with the processfluid for execution of the operation of the processing recipe.
 7. Themethod of claim 1, wherein a combination of each first period of timeand each second period of time equals a timestep of the operation of theprocessing recipe.
 8. The method of claim 1, further comprising:generating, using the set of time values, the control values and secondcontrol values; and sending the control values and the second controlvalues to a fluid flow controller coupled to a source of the processfluid with which to selectively cause the process fluid to flow duringthe operation.
 9. A system comprising: a memory; and a processingdevice, operatively coupled to the memory, to: identify a set of timevalues for a length of time to carry out process fluid delivery withinmultiple processing chambers that concurrently process multiplesubstrates; translate each time value of the set of time values to arecipe parameter for execution of an operation of a processing recipe;and cause the operation to be performed using each recipe parameter as acontrol value to control valves of a fluid panel of the multipleprocessing chambers, wherein, to cause the operation to be performedcomprises, for each processing chamber of the multiple processingchambers, selectively controlling process fluid flow to the processchamber for a first period of time corresponding to a time value of theset of time values and to a divert foreline of the process chamber for asecond period of time.
 10. The system of claim 9, further comprising,for each processing chamber: a fluid line coupled to a fluid flowcontroller, wherein the processing device is further to send the controlvalues to the fluid flow controller; the divert foreline coupled to thefluid line, the divert foreline to carry the process fluid to anabatement unit; and the fluid panel comprising the control valves,wherein the control valves comprise: an isolation valve coupled betweenthe fluid line and the processing chamber; and a divert valve coupledbetween the fluid line and the divert foreline.
 11. The system of claim9, wherein each recipe parameter is positive, and wherein causing theprocess fluid to flow to the processing chamber is performed beforecausing the process fluid to flow to the divert foreline.
 12. The systemof claim 9, wherein each recipe parameter is negative, and whereincausing the process fluid to flow to the divert foreline is performedbefore causing the process fluid to flow to the processing chamber. 13.The system of claim 9, wherein, when the recipe parameter is zero, thecausing the process fluid to flow to the processing chamber is performedduring an entirety of a timestep of the operation of the processingrecipe.
 14. The system of claim 9, wherein the processing device isfurther to: generate, using the set of time values, the control valuesand second control values; and send the control values and the secondcontrol values to a fluid flow controller coupled to a source of theprocess fluid with which to selectively cause the process fluid to flowduring the operation.
 15. The system of claim 9, wherein a combinationof each first period of time and each second period of time equals atimestep of the operation of the processing recipe.
 16. A non-transitorycomputer-readable storage medium storing instructions, which whenexecuted by a processing device, cause the processing device to performa plurality of operations comprising: identifying a set of time valuesfor a length of time to carry out process fluid delivery within multipleprocessing chambers that concurrently process multiple substrates;translating each time value of the set of time values to a recipeparameter for execution of an operation of a processing recipe; andcausing the operation to be performed using each recipe parameter as acontrol value to control valves of a fluid panel of the multipleprocessing chambers, wherein the causing comprises, for each processingchamber of the multiple processing chambers, selectively controllingprocess fluid flow to the process chamber for a first period of timecorresponding to a time value of the set of time values and to a divertforeline of the process chamber for a second period of time.
 17. Thenon-transitory computer-readable storage medium of claim 16, whereineach recipe parameter is positive, and wherein causing the process fluidto flow to the processing chamber is performed before causing theprocess fluid to flow to the divert foreline.
 18. The non-transitorycomputer-readable storage medium of claim 16, wherein each recipeparameter is negative, and wherein causing the process fluid to flow tothe divert foreline is performed before causing the process fluid toflow to the processing chamber.
 19. The non-transitory computer-readablestorage medium of claim 16, wherein, when the recipe parameter is zero,the causing the process fluid to flow to the processing chamber isperformed during an entirety of a timestep of the operation of theprocessing recipe.
 20. The non-transitory computer-readable storagemedium of claim 16, wherein a combination of each first period of timeand each second period of time equals a timestep of the operation of theprocessing recipe, and the plurality of operations further comprise:generating, using the set of time values, the control values and secondcontrol values; and sending the control values and the second controlvalues to a fluid flow controller coupled to a source of the processfluid with which to selectively cause the process fluid to flow duringthe operation.